The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 28, 2008
Filed:
Mar. 25, 2005
Hisanori Akiyama, Tokyo, JP;
Masahiro Jinbo, Tokyo, JP;
Yasunori Ueno, Tokyo, JP;
Hoya Corporation, Tokyo, JP;
Abstract
Aims to enable to supply an optimal and dedicated spectacle lens or spectacle for each spectacle wearer, and also to verify a spectacle wearing state appropriately. A spectacle wearing parameter measurement system, sets a spectacle wearer to be in a distance vision state or a near vision state in which, in the near vision state, at least, one of an eyeball rotation angle and a near vision target distance is changeable optionally; takes an image of the spectacle wearer set in the distance vision state or near vision state by an image pickup device; imports the image; and measures and calculates a spectacle wearing parameter based on the image. A server computer of a factory received the image uses the image data to manufacture a spectacle lens or a spectacle. Further, a spectacle wearing test system verifies whether or not a spectacle wearing state is appropriate based on a figure obtained by a comparison comparing a spectacle wearing parameter measured at present time after manufacturing the spectacle and the spectacle wearing parameter before manufacturing the spectacle.