The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 28, 2008

Filed:

May. 29, 2007
Applicants:

Yasuhide Kawaguchi, Yokohama, JP;

Yoshihiko Sakane, Yokohama, JP;

Daisuke Shirakawa, Yokohama, JP;

Inventors:

Yasuhide Kawaguchi, Yokohama, JP;

Yoshihiko Sakane, Yokohama, JP;

Daisuke Shirakawa, Yokohama, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B29C 35/08 (2006.01); B29C 33/56 (2006.01);
U.S. Cl.
CPC ...
Abstract

A mold and a process for producing a base material having a transferred micropattem, wherein the mold comprises a transparent substrate having chemical bonds resulting from functional groups (x) on a surface on which an interlayer (A) is formed, the interlayer (A) present between the surface of the transparent substrate and a surface layer (B) which has a micropattem for molding a photocurable resin, wherein interlayer (A) is a layer made of a fluoropolymer (1) which is a fluoropolymer having a fluorinated alicyclic structure in its main chain and which has reactive groups (y) reactive with functional groups (x), and surface layer (B) is a layer made of a fluoropolymer (2) which is a fluoropolymer having a fluorinated alicyclic structure in its main chain and which has substantially no reactive groups (y).


Find Patent Forward Citations

Loading…