The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 21, 2008

Filed:

Jun. 14, 2005
Applicant:

Paul Kuiper, Eindhoven, NL;

Inventor:

Paul Kuiper, Eindhoven, NL;

Assignee:

Oće-Technologies B.V., Ma Venlo, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 15/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method for generating a dither mask is disclosed using a local stochastic technique for use for the halftoning of grey scale images by a pixel by pixel comparison of the images against the dither mask. The dither mask is generated by producing a sequence of dot profiles (each dot profile of the sequence corresponding to a grey scale level) using a stacking constraint with incremental grey scale level such that for each dot profile of the sequence the same pixels are selected compared to the preceding dot profile and the increment in the or each dot profile is realized by selecting at least one additional pixel. When determining the position of an additional pixel, the aspect ratio between the dot pitch in a predetermined direction and a direction perpendicular thereto when rendering images is taken into account.


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