The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 21, 2008
Filed:
Jun. 27, 2006
Pamela King Benicewicz, Loudonville, NY (US);
Pavel Alexeyevich Fomitchov, New York, NY (US);
Elena Rozier, Schenectady, NY (US);
John Ruediger Mader Viertl, Niskayuna, NY (US);
Tymm Bradner Schumaker, Saratoga Springs, NY (US);
Pamela King Benicewicz, Loudonville, NY (US);
Pavel Alexeyevich Fomitchov, New York, NY (US);
Elena Rozier, Schenectady, NY (US);
John Ruediger Mader Viertl, Niskayuna, NY (US);
Tymm Bradner Schumaker, Saratoga Springs, NY (US);
General Electric Company, Niskayuna, NY (US);
Abstract
An in-situ laser plasma spectroscopy (LPS) system for automated near real-time elemental depth profiling of a target including: an optical source configured to generate an optical beam, wherein the optical beam is pulsed; an optical probe system configured to deliver the optical beam from the optical source to a surface of a target to generate an ablation plasma; a time resolved spectral detection system configured to generate time resolved spectral data from emission signals from the ablation plasma; and a data acquisition and processing system configured to acquire the time resolved spectral data to determine, in combination with predetermined calibration data, an absolute elemental concentration as a function of depth in near real-time.