The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 21, 2008
Filed:
Mar. 17, 2006
Yasunori Murata, Chofu, JP;
Yasunori Murata, Chofu, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
Disclosed is a measuring method which can measure the decentering of an axis by the measurement of a two-dimensional curved surface profile. This method has a first step of measuring a profile of a examined surface by a probe from a first reference position which is a position separate by a predetermined amount from a predetermined position on the examined surface of a subject lens, a second step of measuring the profile of the examined surface by scanning the examined surface by the probe from the second reference position which is a position separate by a predetermined amount from said predetermined position in a route opposite to the scanning direction of said first step after a rotation of the subject lens; and the step of obtaining the decentering amount of the examined surface by the use of the measurement results obtained at the first and second steps.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile