The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 21, 2008
Filed:
Jun. 01, 2005
Takeyoshi Kano, Shizuoka-ken, JP;
Koichi Kawamura, Shizuoka-ken, JP;
Takeyoshi Kano, Shizuoka-ken, JP;
Koichi Kawamura, Shizuoka-ken, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
The invention provides a metallic pattern forming method comprising: forming a region in which a graft polymer, that directly bonds to a surface of a base material that includes a polyimide and has a functional group that interacts with either an electroless plating catalyst or a precursor thereof, is generated in a pattern shape; imparting either an electroless plating catalyst or a precursor thereof and electroless plating so as to form a metallic film in the pattern shape, wherein the polyimide has at least one structural unit represented by the following Formula (1) or Formula (2) and has a polymerization initiating site in a skeleton thereof. Rrepresents a bivalent organic group. Ris represented by one of Formulae (3) to (6). R, R, Rand Rindependently represents a bivalent organic group.