The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 21, 2008
Filed:
Mar. 24, 2006
Rod Taylor, Gloucester, CA;
Paul Corkum, Gloucester, CA;
Ravi Bhardwaj Vedula, Ottawa, CA;
Eli Simova, Gloucester, CA;
David Rayner, Ottawa, CA;
Cyril Hnatovsky, Ottawa, CA;
Rod Taylor, Gloucester, CA;
Paul Corkum, Gloucester, CA;
Ravi Bhardwaj Vedula, Ottawa, CA;
Eli Simova, Gloucester, CA;
David Rayner, Ottawa, CA;
Cyril Hnatovsky, Ottawa, CA;
National Research Council of Canada, Ottawa, On, CA;
Abstract
To make high quality long-range periodic nanostructures in a transparent or semi-transparent substrate, the transparent or semi-transparent substrate is scanned with a linearly polarized laser beam generated by a femtosecond laser and exceeding a predetermined energy/pulse threshold along a scanning path. Sub-diffraction limit structures are formed as periodic planes of modified material in the transparent or semi-transparent substrate extending along the scanning path. The modified material can then be chemically etched to form cavities.