The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 21, 2008

Filed:

Jul. 07, 2005
Applicants:

Guido Spinola Durante, Gavirate, IT;

Simone Sassolini, Vidigulfo, IT;

Marco Ferrera, Abbiategrasso, IT;

Mauro Marchi, Magenta, IT;

Inventors:

Guido Spinola Durante, Gavirate, IT;

Simone Sassolini, Vidigulfo, IT;

Marco Ferrera, Abbiategrasso, IT;

Mauro Marchi, Magenta, IT;

Assignee:

STMicroelectronics S.r.l., Agrate Brianza, IT;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/306 (2006.01); H01L 23/24 (2006.01); G01P 9/04 (2006.01);
U.S. Cl.
CPC ...
Abstract

Micro-electro-mechanical structure formed by a substrate of semiconductor material and a suspended mass extending above the substrate and separated therefrom by an air gap. An insulating region of a first electrically insulating material extends through the suspended mass and divides it into at least one first electrically insulated suspended region and one second electrically insulated suspended region. A plug element of a second electrically insulating material different from the first electrically insulating material is formed underneath the insulating region and constitutes a barrier between the insulating region and the air gap for preventing removal of the insulating region during fabrication, when an etching agent is used for removing a sacrificial layer and forming the air gap.


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