The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7436993 B1

PDF
Full Text
Expired
Date of Patent:
Oct. 14, 2008

Filed:

Mar. 15, 2005
Applicants:

Hiroyuki Onishi, Kyoto, JP;

Yasushi Sasa, Kyoto, JP;

Inventors:

Hiroyuki Onishi, Kyoto, JP;

Yasushi Sasa, Kyoto, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

In a defect detection apparatus, images of first to third inspection areas on a substrate are picked up to acquire first to third images. A positional difference acquisition part () acquires a first difference vector between the first image and the second image and a second difference vector between the second image and the third image. A differential image generation part () generates a first differential image between the first image and the second image while adjusting a position of the first image to the second image on the basis of the first difference vector and a second differential image between the second image and the third image while adjusting a position of the second image to the third image on the basis of the second difference vector. Then, a position of the second differential image is adjusted to the first differential image on the basis of the second difference vector and the second differential image after position adjustment and the first differential image are compared with each other, to detect a defect in a periodic pattern on the substrate with high accuracy.


Find Patent Forward Citations

Quick Actions:

Onishi, Hiroyuki. (2008). Apparatus and method for detecting defects in periodic pattern on object (U.S. Patent No. 7436993). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7436993

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…