The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 14, 2008

Filed:

Dec. 29, 2005
Applicant:

Joonyoung Yang, Buchon-Si, KR;

Inventor:

JoonYoung Yang, Buchon-Si, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 21/84 (2006.01);
U.S. Cl.
CPC ...
Abstract

An LCD and a method of manufacturing the same using at most six mask processes are provided. An active layer and a storage electrode are simultaneously formed by diffraction exposure. Multiple ion implantations are performed using a photoresist or the gate electrode to mask different areas of an underlying semiconductor. Source and drain electrodes and a pixel electrode are simultaneously formed by diffraction exposure. First and second connection electrodes that lower the contact resistance between the drain electrode and the active layer are formed by a lift-off process.


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