The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 14, 2008
Filed:
Jun. 09, 2005
Applicants:
Sheng Peng, Hockessin, DE (US);
Weiming Qiu, Wilmington, DE (US);
Roger Harquail French, Wilmington, DE (US);
Inventors:
Sheng Peng, Hockessin, DE (US);
Weiming Qiu, Wilmington, DE (US);
Roger Harquail French, Wilmington, DE (US);
Assignee:
E.I. du Pont de Nemours and Company, Wilmington, DE (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03C 1/00 (2006.01); G03B 27/58 (2006.01);
U.S. Cl.
CPC ...
Abstract
Processes and apparatuses using polycyclic fluoroalkanes that are highly transparent to UV wavelengths ranging from about 190 nm to 260 nm are provided. The polycylic fluoroalkanes are useful in a wide variety of applications, including optical couplants, optical cements, optical elements, optical inspection media for semiconductor wafers and devices, and immersion photolithography, particularly at 193 and 248 nm exposure wavelength.