The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 14, 2008
Filed:
Oct. 04, 2004
Yusuke Muraoka, Koyoto, JP;
Tomomi Iwata, Kyoto, JP;
Kimitsugu Saito, Kyoto, JP;
Masahiro Yamagata, Hyogo, JP;
Yoichi Inoue, Hyogo, JP;
Hisanori Oshiba, Hyogo, JP;
Yusuke Muraoka, Koyoto, JP;
Tomomi Iwata, Kyoto, JP;
Kimitsugu Saito, Kyoto, JP;
Masahiro Yamagata, Hyogo, JP;
Yoichi Inoue, Hyogo, JP;
Hisanori Oshiba, Hyogo, JP;
Abstract
Mixing bathsA andB which temporarily hold chemical agents A and B respectively are disposed. The mixing bathsA andB are each connected with a high-pressure fluid supplying unit. For surface treatment using a mixture of the chemical agent A and SCF (processing fluid), SCF is fed under pressure from the high-pressure fluid supplying unitto the mixing bathA which already holds the chemical agent A, whereby the chemical agent A dissolves in SCF flowing into the mixing bathA and the mixture of the chemical agent A and SCF (processing fluid) is created. As a high-pressure valve (processing fluid introducing valve)is opened, the processing fluid is sent into a pressure vessel. This achieves a predetermined surface treatment of a substrate which has been set inside the pressure vessel, using the processing fluid.