The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 14, 2008
Filed:
Apr. 13, 2005
Chang-sup Mun, Incheon-si, KR;
Doo-won Kwon, Seoul, KR;
Hyung-ho Ko, Seoul, KR;
Chang-ki Hong, Seongnam-si, KR;
Sang-jun Choi, Seoul, KR;
Chang-Sup Mun, Incheon-si, KR;
Doo-Won Kwon, Seoul, KR;
Hyung-Ho Ko, Seoul, KR;
Chang-Ki Hong, Seongnam-si, KR;
Sang-Jun Choi, Seoul, KR;
Samsung Electronics Co., Ltd., Suwon-Si, KR;
Abstract
Disclosed are a cleaning solution for preventing damage of a silicon germanium layer when cleaning a semiconductor device including the silicon germanium layer and a cleaning method using the same. The cleaning solution of a silicon germanium layer includes from about 0.01 to about 2.5 percent by weight of a non-ionic surfactant with respect to 100 percent by weight of the cleaning solution, about 0.05 to about 5.0 percent by weight of an alkaline compound with respect to the cleaning solution and a remaining amount of pure water. The damage to an exposed silicon germanium layer can be prevented when cleaning a silicon substrate having a silicon germanium layer. Impurities present on the surface portion of the silicon germanium layer can be effectively removed.