The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 14, 2008
Filed:
Dec. 12, 2006
Chun-ching Shih, Palos Verdes Estates, CA (US);
Chun-Ching Shih, Palos Verdes Estates, CA (US);
Northrop Grumman Space & Mission Systems Corporation, Los Angeles, CA (US);
Abstract
Systems and methods for shifting the phase of incident light to induce a continuous phase variation in an azimuthal direction. A phase mask apparatus includes a conical mirror assembly and a flexible annular reflector that substantially surrounds at least a portion of the conical mirror assembly. The flexible annular reflector is configured to receive reflected light from the conical mirror assembly. A plurality of driver assemblies are operative to deform the flexible annular reflector as to produce the desired phase response in light reflected from the annular reflector.