The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 07, 2008
Filed:
Dec. 29, 2005
Nadya Strelkova, Portland, OR (US);
Santosh Menon, Troutdale, OR (US);
Nadya Strelkova, Portland, OR (US);
Santosh Menon, Troutdale, OR (US);
LSI Logic Corporation, Milpitas, CA (US);
Abstract
A method of detecting potential failures from a corrected mask design for an integrated circuit includes steps of receiving as input a corrected mask design for an integrated circuit, searching the corrected mask design to find a critical edge of a polygon that is closer than a selected minimum distance from a polygon edge opposite the critical edge, constructing a critical region bounded by the critical edge and the polygon edge opposite the critical edge, comparing the critical region to a potential defect criterion, and generating as output a location of the critical region when the critical region satisfies the potential defect criterion.