The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 07, 2008

Filed:

Feb. 20, 2004
Applicants:

Max Deffenbaugh, Houston, TX (US);

William B. Heard, Alexandria, VA (US);

Chun Huh, Austin, TX (US);

Tao Sun, Missouri City, TX (US);

David C. Hoyal, Houston, TX (US);

Inventors:

Max Deffenbaugh, Houston, TX (US);

William B. Heard, Alexandria, VA (US);

Chun Huh, Austin, TX (US);

Tao Sun, Missouri City, TX (US);

David C. Hoyal, Houston, TX (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G05F 19/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention is a method for predicting the grain size distribution at a designated location within a water-lain sedimentary deposit. Initially, the vertical thickness of the sedimentary deposit at the designated location must be determined, as well as the vertical thickness and grain size distribution at a second location different from the designated location. Second, a distance parameter corresponding to the two locations must be determined. Finally the distance parameter is used, along with the initially determined vertical thickness at both locations and the grain size distribution at the second location to calculate the grain size distribution at the designated location.


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