The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 07, 2008
Filed:
Feb. 15, 2006
Kazuya Uenishi, Nara, JP;
Atsushi Sudo, Tokyo, JP;
Hiroshi Morikawa, Uki, JP;
Takeshi Endo, Yokohama, JP;
Olaf Lammerschop, Krefeld, DE;
Thomas Huver, Duesseldorf, DE;
Pavel Gentschev, Duesseldorf, DE;
Kazuya Uenishi, Nara, JP;
Atsushi Sudo, Tokyo, JP;
Hiroshi Morikawa, Uki, JP;
Takeshi Endo, Yokohama, JP;
Olaf Lammerschop, Krefeld, DE;
Thomas Huver, Duesseldorf, DE;
Pavel Gentschev, Duesseldorf, DE;
Henkel Kommanditgesellschaft auf Aktien, Duesseldorf, DE;
Abstract
The present invention relates to 1,3-oxathiolane-2-thione compounds of the general formula (I): wherein Rand Rare the same or different, each of which denotes a straight-chain or branched alkoxy residue with 1 to 6 carbon atoms or an aryloxy or aralkyloxy residue, Ris different or the same as Ror Ror an aliphatic residue, an amino residue, a halogen residue, an aromatic or heteroaromatic residue, or an araliphatic or heteroaraliphatic residue, Ris a bridging group selected from the groups consisting of aliphatic, heteroaliphatic, araliphatic, heteroaraliphatic, aromatic and heteroaromatic groups and Ris hydrogen, an aliphatic, heteroaliphatic, araliphatic, heteroaraliphatic, aromatic, heteroaromatic, cycloaliphatic or heterocycloaliphatic group or Rand Rform a cycloaliphatic, cycloheteroaliphatic, aromatic or heteroaromatic residue, which is optionally substituted with an aliphatic, heteroaliphatic residue serving as a bridging group to the silicon atom and X and Y are different and selected from oxygen and sulfur and mixtures of such compounds.