The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 07, 2008
Filed:
Nov. 01, 2004
Gregory S. MC Carty, State College, PA (US);
Jeffrey M. Catchmark, Bellfonte, PA (US);
Guy P. Lavallee, State College, PA (US);
Gregory S. Mc Carty, State College, PA (US);
Jeffrey M. Catchmark, Bellfonte, PA (US);
Guy P. Lavallee, State College, PA (US);
The Penn State Research Foundation, University Park, PA (US);
Abstract
A method of fabricating a pattern on a surface of a substrate includes applying at least one non-molecular lithographic technique with at least one molecular lithographic technique to simultaneously define a size and shape of at least one of the features of the pattern. The pattern includes a nanoscale gap between features, the gap having a width defined by the thickness of one or more molecular layers used in one of the molecular lithographic techniques.