The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 07, 2008
Filed:
Jan. 05, 2004
Masakatsu Maruyama, Kobe, JP;
Nobuyuki Kawakami, Kobe, JP;
Yoshito Fukumoto, Kobe, JP;
Takayuki Hirano, Kobe, JP;
Masakatsu Maruyama, Kobe, JP;
Nobuyuki Kawakami, Kobe, JP;
Yoshito Fukumoto, Kobe, JP;
Takayuki Hirano, Kobe, JP;
Kabushiki Kaisha Kobe Seiko Sho, Hyogo, JP;
Abstract
A dielectric line having a sufficient ensured strength and being suitable for mass production and a production method therefor are provided. The production method is a method for manufacturing a dielectric line having a dielectric strip which is provided between two conductive plates approximately parallel to each other and which has a width smaller than that of the conductive plates, and dielectric medium layers which are filled between the conductive plates other than the dielectric strip and which is composed of a porous material having a dielectric constant smaller than that of the dielectric strip. The dielectric line (NRD guide) is produced by film forming steps Sand Sin which a film of a dielectric raw material is formed on one of the conductive plates, a strip exposure step Sin which a part of the above film having a shape corresponding to the dielectric strip is exposed to predetermined light, beams, or vapor, and pore forming steps Sand Sin which the entire film of the dielectric raw material is made porous.