The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 07, 2008
Filed:
Mar. 25, 2004
Applicants:
Sergei Lyuksyutov, Akron, OH (US);
Shane Juhl, Dayton, OH (US);
Richard Vaia, Beavercreek, OH (US);
Inventors:
Assignee:
United States of America as represented by the Secretary of the Air Force, Washington, DC (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B05D 5/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
An atomic force microscopy polymer nanolithography method is described. The method of the present invention enables rapid creation of raised or depressed features in a polymer film. The features are generated by mass transport of polymer within an initially uniform, planar film via localized softening of attoliters of polymer by Joule heating. This localized softening of the polymer is accomplished by current flow between the AFM tip and a conductive wafer upon which the layer of polymer is mounted.