The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 07, 2008

Filed:

Feb. 24, 2004
Applicants:

Hirofumi Fukuoka, Annaka, JP;

Susumu Ueno, Annaka, JP;

Takeshi Fukuda, Chiyoda-ku, JP;

Inventors:

Hirofumi Fukuoka, Annaka, JP;

Susumu Ueno, Annaka, JP;

Takeshi Fukuda, Chiyoda-ku, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C01B 33/20 (2006.01);
U.S. Cl.
CPC ...
Abstract

A silicon oxide powder can be continuously prepared by feeding a raw material powder mixture containing silicon dioxide powder into a reaction chamber () at a temperature of 1,100-1,600° C., to produce a silicon oxide gas, transferring the silicon oxide gas to a deposition chamber () through a transfer conduit () maintained at a temperature of from higher than 1,000° C. to 1,300° C., causing silicon oxide to deposit on a substrate () which is disposed and cooled in the deposition chamber, scraping the silicon oxide deposit, and recovering the deposit in a recovery chamber (). The method and apparatus is capable of continuous and stable production of amorphous silicon oxide powder of high purity.


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