The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 30, 2008
Filed:
Mar. 31, 2006
Applicant:
Tetsuo Ohara, Sutton, MA (US);
Inventor:
Tetsuo Ohara, Sutton, MA (US);
Assignee:
Other;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01R 23/00 (2006.01); G01R 35/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
An improved signal processing method and apparatus are presented for use in real-time sub-nanometer scale position measurements with the aid of probing sensors and/or beams scanning periodically undulating surfaces such as a grating and diffraction patterns generated thereby, and the like, enabling greater sub-nanometer precision, higher stage scanner movement speeds, and simultaneous high accuracy and top speed measuring capabilities.
Ohara, Tetsuo. (2008). Signal processing method and apparatus for use in real-time subnanometer scale position measurements with the aid of probing sensors and beams scanning periodically undulating surfaces such as gratings and diffraction patterns generated thereby, and the like (U.S. Patent No. 7430484). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7430484
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