The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 30, 2008
Filed:
Mar. 29, 2005
Shinichirou Mori, Chiba, JP;
Masahiro Endo, Chiba, JP;
Shinichirou Mori, Chiba, JP;
Masahiro Endo, Chiba, JP;
National Institute of Radiological Sciences, Chiba-shi, Chiba, JP;
Abstract
A heel effect compensation filter is configured to have a thickness distribution that uniforms an X-ray intensity angular distribution that is nonuniform in the body axis direction of a subject in an X-ray flux irradiated space. The space is formed by an X-ray flux diverging from an anode in a body width direction of the subject and diverging in a shape of an approximate sector in the body axis direction due to the heel effect, when the X-ray flux generated on the anode by irradiating a thermoelectron beam flux from a cathode to the anode is irradiated on the subject. The thickness distribution can be obtained using a predetermined formula.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile