The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 30, 2008

Filed:

Mar. 07, 2007
Applicants:

Heidi M. Munnelly, Windsor, CO (US);

Kevin D. Wieland, Greeley, CO (US);

Inventors:

Heidi M. Munnelly, Windsor, CO (US);

Kevin D. Wieland, Greeley, CO (US);

Assignee:

Eastman Kodak Company, Rochester, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/028 (2006.01); G03F 7/033 (2006.01); G03F 7/14 (2006.01);
U.S. Cl.
CPC ...
Abstract

A radiation-sensitive composition includes a free radically polymerizable component, an initiator composition capable of generating free radicals sufficient to initiate polymerization upon exposure to imaging radiation, an infrared radiation absorbing dye having a tetraaryl pentadiene chromophore, a polymeric binder comprising a polymer backbone to which are directly or indirectly linked poly(alkylene glycol) side chains, and a nonionic phosphate acrylate having a molecular weight of at least 250. This composition can be used to prepare a negative-working imageable element that is sensitive to suitable imaging radiation and can be imaged at relatively low energy and developed either on-press or off-press.


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