The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 23, 2008
Filed:
May. 03, 2005
Xingwei Wu, Brampton, CA;
George A. Kupsky, Sherwood Park, CA;
Xingwei Wu, Brampton, CA;
George A. Kupsky, Sherwood Park, CA;
IFire Technology Corp., Fort Saskatchewan, CA;
Abstract
The invention provides a method of forming a thick film dielectric layer in an EL laminate of the type including one or more phosphor layers sandwiched between a front and a rear electrode with the phosphor layer being separated from the rear electrode by a thick film dielectric layer. The method includes depositing a ceramic material in one or more layers by a thick film technique to form a dielectric layer having a thickness of 10 to 300 μm; pressing the dielectric layer to form a densified layer with reduced porosity and surface roughness; and sintering the dielectric layer to form a pressed, sintered dielectric layer which, in an EL laminate, has an improved uniform luminosity over an unpressed, sintered dielectric layer of the same composition.