The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 23, 2008
Filed:
May. 06, 2004
Naoyuki Kawanishi, Kanagawa, JP;
Tadashi Hayashi, Kanagawa, JP;
Naoyuki Kawanishi, Kanagawa, JP;
Tadashi Hayashi, Kanagawa, JP;
Fujifilm Corporation, Tokyo, JP;
Abstract
An antiglare film producing method of film production by surface embossing to polymer film is provided. The polymer film includes a support of triacetyl cellulose, and an anti-reflection layer overlaid thereon. An embossing roller is used for surface embossing to a front surface of the support or a surface of the anti-reflection layer. In the film producing method, the embossing roller is produced according to electrodischarge machining (EDM). A surface of the embossing roller has an arithmetic average roughness Ra of 0.3-1.0 micron, and has a protruding and retreating pattern with an average cycle length RSm of 5-30 microns.