The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 23, 2008
Filed:
Apr. 12, 2004
Bulent M. Basol, Manhattan Beach, CA (US);
Jalal Ashjaee, Cupertino, CA (US);
Boris Govzman, Sunnyvale, CA (US);
Homayoun Talieh, San Jose, CA (US);
Bernard M. Frey, Livermore, CA (US);
Bulent M. Basol, Manhattan Beach, CA (US);
Jalal Ashjaee, Cupertino, CA (US);
Boris Govzman, Sunnyvale, CA (US);
Homayoun Talieh, San Jose, CA (US);
Bernard M. Frey, Livermore, CA (US);
Novellus Systems, Inc., San Jose, CA (US);
Abstract
An apparatus for electropolishing a conductive layer on a wafer using a solution is disclosed. The apparatus comprises an electrode assembly immersed in the solution configured proximate to the conductive layer having a longitudinal dimension extending to at least a periphery of the wafer, the electrode assembly including an elongated contact electrode configured to receive a potential difference, an isolator adjacent the elongated contact electrode, and an elongated process electrode adjacent the isolator configured to receive the potential difference, a voltage supply is configured to supply the potential difference between the contact electrode and the process electrode to electropolish the conductive layer on the wafer.