The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 16, 2008
Filed:
Nov. 18, 2005
Applicants:
Geethakrishnan Narasimhan, Sunnyvale, CA (US);
Saurabh D. Chowdhury, Dallas, TX (US);
Inventors:
Geethakrishnan Narasimhan, Sunnyvale, CA (US);
Saurabh D. Chowdhury, Dallas, TX (US);
Assignee:
Cypress Semiconductor Corporation, San Jose, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/336 (2006.01); H01L 21/76 (2006.01); H01L 21/3205 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method of making a semiconductor structure includes etching an isolation oxide. The isolation oxide is in a substrate, a gate layer is on the substrate, a patterned metallic layer is on the gate layer, and a first patterned etch-stop layer is on the metallic layer.