The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 16, 2008
Filed:
Feb. 04, 2005
Kelly J. Bruland, Portland, OR (US);
Brian W. Baird, Oregon City, OR (US);
Ho Wai Lo, Portland, OR (US);
Stephen N. Swaringen, Rockwall, TX (US);
Frank G. Evans, Dundee, OR (US);
Kelly J. Bruland, Portland, OR (US);
Brian W. Baird, Oregon City, OR (US);
Ho Wai Lo, Portland, OR (US);
Stephen N. Swaringen, Rockwall, TX (US);
Frank G. Evans, Dundee, OR (US);
Electro Scientific Industries, Inc., Portland, OR (US);
Abstract
Methods and systems selectively irradiate structures on or within a semiconductor substrate using a plurality of laser beams. The structures are arranged in a row extending in a generally lengthwise direction. The method generates a first laser beam that propagates along a first laser beam axis that intersects the semiconductor substrate and a second laser beam that propagates along a second laser beam axis that intersects the semiconductor substrate. The method directs the first and second laser beams onto distinct first and second structures in the row. The second spot is offset from the first spot by some amount in a direction perpendicular to the lengthwise direction of the row. The method moves the first and second laser beam axes relative to the semiconductor substrate along the row substantially in unison in a direction substantially parallel to the lengthwise direction of the row.