The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7423726 B1

PDF
Full Text
Expired
Date of Patent:
Sep. 09, 2008

Filed:

Mar. 28, 2007
Applicant:

Yuji Kosugi, Utsunomiya, JP;

Inventor:

Yuji Kosugi, Utsunomiya, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/42 (2006.01); G03B 27/68 (2006.01);
U.S. Cl.
CPC ...
Abstract

An exposure apparatus for exposing a substrate. A stage holds and moves the substrate, a measuring device measures a position of a surface of the substrate, and a controller defines an arrangement of measurement points with respect to each of a plurality of shot regions arranged along a straight line, and causes the measuring device to sequentially measure positions of the surface with respect to the defined measurement points in the plurality of shot regions, while the stage moves the substrate along the straight line. A timing at which the measuring device measures a position of the surface is controlled so that a first time interval and a second time interval are different from each other.


Find Patent Forward Citations

Kosugi, Yuji. (2008). Exposure apparatus and device manufacturing method (U.S. Patent No. 7423726). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7423726

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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