The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 09, 2008

Filed:

Apr. 20, 2004
Applicants:

Nobuyuki Moriyama, Aichi, JP;

Kazuhito Mawatari, Aichi, JP;

Fumihiro Mizutani, Aichi, JP;

Yukinobu Kuno, Aichi, JP;

Katsuya Matsumoto, Aichi, JP;

Masaru Koike, Aichi, JP;

Inventors:

Nobuyuki Moriyama, Aichi, JP;

Kazuhito Mawatari, Aichi, JP;

Fumihiro Mizutani, Aichi, JP;

Yukinobu Kuno, Aichi, JP;

Katsuya Matsumoto, Aichi, JP;

Masaru Koike, Aichi, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23Q 15/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

An apparatus for centering a log to allow an optimum yield axis and a maximum radius of rotation of the log to be calculated more accurately than conventionally possible. The angle of rotation of a log M is detected by a rotation angle detector that is engaged with a preliminary axis c about which the log M is rotated. A contour of the log for calculating the optimum yield axis of the log and a contour for calculating the maximum radius of rotation of the log are measured separately. The contour for calculating the optimum yield axis is measured in a fixed-point manner by measuring the log at a plurality of certain measurement points with beam reflection scanners. The contour for calculating the maximum radius of rotation is measured in a comprehensive manner using swing-angle detectors engaged with contact-swinging detection members provided individually in the plural measurement sections.


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