The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 02, 2008

Filed:

Mar. 25, 2005
Applicants:

Ming-hau Tung, San Francisco, CA (US);

Philip D. Floyd, Redwood City, CA (US);

Brian W. Arbuckle, Danville, CA (US);

Inventors:

Ming-Hau Tung, San Francisco, CA (US);

Philip D. Floyd, Redwood City, CA (US);

Brian W. Arbuckle, Danville, CA (US);

Assignee:

IDC, LLC, San Francisco, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 26/00 (2006.01); H01L 23/02 (2006.01); H01L 21/76 (2006.01);
U.S. Cl.
CPC ...
Abstract

Methods for making MEMS devices such as interferometric modulators involve selectively removing a sacrificial portion of a material to form an internal cavity, leaving behind a remaining portion of the material to form a post structure. The material may be blanket deposited and selectively altered to define sacrificial portions that are selectively removable relative to the remaining portions. Alternatively, a material layer can be laterally recessed away from openings in a covering layer. These methods may be used to make unreleased and released interferometric modulators.


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