The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 02, 2008
Filed:
Feb. 17, 2006
Length measurement pattern, semiconductor device, and method of manufacturing a semiconductor device
Applicant:
Ryuichi Okamura, Kanagawa, JP;
Inventor:
Ryuichi Okamura, Kanagawa, JP;
Assignee:
NEC Electronics Corporation, Kanagawa, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 23/00 (2006.01); G03F 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A length measurement pattern is used for forming a contact and a via on a diffusion layer and on a lower layer interconnect, respectively, with a photoresist. The length measurement pattern includes a first patternserving as an object of length measurement in length measurement SEM and a second patterndisposed to be spaced apart from the first patternand used for positioning and focusing of the length measurement SEM.