The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 02, 2008
Filed:
Oct. 27, 2005
Kyoko Ohno, Hamamatsu, JP;
Kyoko Ohno, Hamamatsu, JP;
Yamaha Corporation, Hamamatsu-shi, JP;
Abstract
On the basis of performance event information, at least two notes to be sounded in succession or in an overlapping relation to each other are detected, and a tone pitch difference between the detected at least two notes is detected. Tone pitch difference limitation ranges are set in corresponding relation to various rendition styles. Rendition style to be imparted to the notes to be sounded in succession or in an overlapping relation is designated, and a comparison is made between a tone pitch difference limitation range corresponding to the designated rendition style and the detected tone pitch difference, so as determine whether the designated rendition style is applicable or not. In this way, whether the designated rendition style is to be applied or not is automatically controlled in accordance with the tone pitch difference of the at least two notes to be imparted with the rendition style. Further, pitch range limitation ranges are set in corresponding relation to various rendition styles, and the applicability of a designated rendition style is controlled depending on whether or not a tone to be imparted with the designated rendition style is within the pitch range limitation range corresponding to the designated rendition style.