The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 02, 2008
Filed:
Oct. 31, 2006
Akio Koike, Yokohama, JP;
Yasutomi Iwahashi, Yokohama, JP;
Yasuyuki Takimoto, Yokohama, JP;
Shinya Kikugawa, Tokyo, JP;
Akio Koike, Yokohama, JP;
Yasutomi Iwahashi, Yokohama, JP;
Yasuyuki Takimoto, Yokohama, JP;
Shinya Kikugawa, Tokyo, JP;
Asahi Glass Company, Limited, Tokyo, JP;
Abstract
It is to provide a silica glass containing TiO, having a wide temperature range wherein the coefficient of thermal expansion is substantially zero. A silica glass containing TiO, which has a TiOconcentration of from 3 to 10 mass %, a OH group concentration of at most 600 mass ppm and a Ticoncentration of at most 70 mass ppm, characterized by having a fictive temperature of at most 1,200° C., a coefficient of thermal expansion from 0 to 100° C. of 0±150 ppb/° C., and an internal transmittance Tper 1 mm thickness in a wavelength range of from 400 to 700 nm of at least 80%. A process for producing a silica glass containing TiO, which comprises porous glass body formation step, F-doping step, oxygen treatment step, densification step and vitrification step.