The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 02, 2008
Filed:
Feb. 13, 2006
Benjamin Chen, San Jose, CA (US);
Hongping Yuan, Fremont, CA (US);
Danning Yang, Fremont, CA (US);
Wei Zhang, Fremont, CA (US);
Hugh C. Hiner, Fremont, CA (US);
Lei Wang, Fremont, CA (US);
Yingjian Chen, Fremont, CA (US);
Brant Nease, Fremont, CA (US);
Benjamin Chen, San Jose, CA (US);
Hongping Yuan, Fremont, CA (US);
Danning Yang, Fremont, CA (US);
Wei Zhang, Fremont, CA (US);
Hugh C. Hiner, Fremont, CA (US);
Lei Wang, Fremont, CA (US);
Yingjian Chen, Fremont, CA (US);
Brant Nease, Fremont, CA (US);
Western Digital (Fremont), LLC, Fremont, CA (US);
Abstract
The method and system for providing a magnetic element are disclosed. The method and system include providing a magnetic element stack that includes a plurality of layers and depositing a stop layer on the magnetic element stack. The method and system also include providing a dielectric antireflective coating (DARC) layer on the stop layer, forming a single layer mask for defining the magnetic element on a portion of the DARC layer, and removing a remaining portion of the DARC layer not covered by the single layer mask. The portion of the DARC layer covers a portion of the stop layer. The method further includes removing a remaining portion of the stop layer and defining the magnetic element using at least the portion of stop layer as a mask.