The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 02, 2008
Filed:
Aug. 31, 2004
Masaaki Ikeda, Kyoto, JP;
Shigeru Aoyama, Kyoto, JP;
Masaaki Ikeda, Kyoto, JP;
Shigeru Aoyama, Kyoto, JP;
OMRON Corporation, Kyoto, JP;
Abstract
A manufacturing method of an optical device having a micro-asperity pattern that has various kinds of accurate three-dimensional shapes and is realized as thin films includes: a first step of coating a substrate with a resin thin film made of a photosensitive resin; a second step of forming a material-property-changed part at a part of the resin thin film by photolithography; a third step of controlling a temperature of the resin thin film to be a temperature that is lower than a photosensitivity extinction temperature or a hardening reaction starting temperature of the resin thin film; a fourth step of pressing a die having a micro-asperity pattern against the surface of the resin thin film to form a first micro-asperity pattern in a state in which the resin thin film has been softened or melted; and a fifth step of forming a second micro-asperity pattern at a part of the resin thin film by removing the material-property-changed part.