The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 02, 2008
Filed:
Aug. 17, 2006
Jong Hyurk Park, Daegu, KR;
Hyo Young Lee, Daejeon, KR;
Nak Jin Choi, Daegu, KR;
Jung Hyun Lee, Gyeonggi-do, KR;
Gyeong Sook Bang, Daejeon, KR;
Jong Hyurk Park, Daegu, KR;
Hyo Young Lee, Daejeon, KR;
Nak Jin Choi, Daegu, KR;
Jung Hyun Lee, Gyeonggi-do, KR;
Gyeong Sook Bang, Daejeon, KR;
Electronics and Telecommunications Research Institute, Daejeon, KR;
Abstract
Provided is a method of fabricating a nanoimprint mold which can form sub-100 nm fine pattern structures. The method includes forming patterns on a first substrate using an E-beam lithography (EBL) process, and transferring the patterns formed on the first substrate to a second substrate using a nanoimprint lithography (NIL) process to complete an NIL mold. Accordingly, the method can easily fabricate the nanoimprint mold at low costs on a quartz or glass substrate, which is not suitable for an EBL process to produce sub-100 nm patterns, by utilizing the advantages of the EBL process with a resolution of tens of nanometers.