The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 02, 2008
Filed:
Aug. 24, 2004
Applicant:
Jae-gyung Ahn, Pleasanton, CA (US);
Inventor:
Jae-Gyung Ahn, Pleasanton, CA (US);
Assignee:
Integrated Device Technology, Inc., San Jose, CA (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A photomask and a method for forming a photomask are disclosed in which the photomask pattern is modified to bridge features that are likely to produce electrostatic discharge related defects. In one embodiment those adjacent features that are closely spaced together and have a high surface area differential, are bridged using a bridge that has a width less than the minimum optical resolution of the photolithography process.