The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 02, 2008

Filed:

Mar. 05, 2002
Applicants:

Hubert Benzel, Pliezhausen, DE;

Heribert Weber, Nuertingen, DE;

Hans Artmann, Magstadt, DE;

Frank Schaefer, Tuebingen, DE;

Inventors:

Hubert Benzel, Pliezhausen, DE;

Heribert Weber, Nuertingen, DE;

Hans Artmann, Magstadt, DE;

Frank Schaefer, Tuebingen, DE;

Assignee:

Robert Bosch GmbH, Stuttgart, DE;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B81B 1/00 (2006.01); H01L 31/028 (2006.01); H01L 31/18 (2006.01);
U.S. Cl.
CPC ...
Abstract

A simple and cost-effective possibility is proposed for producing optically transparent regions () in a silicon substrate (), by the use of which both optically transparent regions of any thickness and optically transparent regions over a cavity in a silicon substrate are able to be implemented. For this purpose, first at least a specified region () of the silicon substrate () is etched porous. Thereafter, the specified porous region () of the silicon substrate () is oxidized.


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