The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 26, 2008

Filed:

Jan. 30, 2003
Applicant:

Lee Weng, Bellevue, WA (US);

Inventor:

Lee Weng, Bellevue, WA (US);

Assignee:

Rosetta Inpharmatics LLC, Seattle, WA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 19/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention provides methods for analyzing measurement errors in measured signals obtained in an experiment, e.g., measured intensity signals obtained in a microarray gene expression experiment. In particular, the invention provides a method for transforming measured signals into a domain in which the measurement errors in the transformed signals are normalized by errors as determined from an error model. The methods of the invention are particularly useful for analyzing measurement errors in signals in which at least portion of the error is dependent on the magnitudes of the signals. Such transformed signals permit analysis of data using traditional statistical methods, e.g., ANOVA and regression analysis. Magnitude-independent errors can also be used for comparing level of measurement errors in signals of different magnitudes.


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