The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 26, 2008

Filed:

Oct. 13, 2000
Applicants:

David H. Donovan, San Diego, CA (US);

Miquel Boleda, Barcelona, ES;

Johan Lammens, Barcelona, ES;

Francesc Subirada, Barcelona, ES;

Inventors:

David H. Donovan, San Diego, CA (US);

Miquel Boleda, Barcelona, ES;

Johan Lammens, Barcelona, ES;

Francesc Subirada, Barcelona, ES;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06K 15/00 (2006.01); H04N 1/40 (2006.01);
U.S. Cl.
CPC ...
Abstract

CDE is measured for each nozzle array, to enable modification of a mapping between input image data and intended printing marks to compensate for the CDE. Printing proceeds using the modified mapping, which is either an optical-density transformation of data to printing marks or a spatial-resolution relation between image data and intended pixel grid. The density transformation preferably includes a dither mask (but can be error-diffusion thresholding instead); the resolution relation includes scaling of image data to pixel grid. For some invention forms, CDE includes printing-density defects, measured and used to derive a correction pattern—in turn used to modify halftone thresholding. For other forms CDE includes swath-height error, but still this is measured and used to derive a correction pattern etc. For still other forms, however, CDE includes swath-height error and correction takes the form of scaling. When the halftoning forms are applied to plural-pass printing, a printmask is used to map the dither mask etc. to the nozzle array, enabling application of the correction to the mask. Halftone forms ideally uses a gamma function, though threshold or linear corrections are possible instead. Halftone correction is effective in single-pass printing. The swath-height correction can modify heights of all nozzle arrays. Computations are done at most only once for a full image.


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