The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 26, 2008
Filed:
Oct. 06, 2005
Miwaki Ando, Utsunomiya, JP;
Yoshinori Ohsaki, Utsunomiya, JP;
Miwaki Ando, Utsunomiya, JP;
Yoshinori Ohsaki, Utsunomiya, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
Provided is an exposure apparatus including a projection optical system for projecting an exposure pattern onto an object to be exposed, a measurement device for measuring an optical performance of the projection optical system by guiding light to the projection optical system through a measurement pattern to detect interference fringes formed by the light emitted from the projection optical system, and an adjustment portion for adjusting a numerical aperture of the light that illuminates the measurement pattern, in which the adjustment portion adjusts the numerical aperture so that the visibility of the interference fringes V, which is defined as V=(I−I)/(I+I), is equal to or more than 0.3, where Irepresents the maximum amount of light of the interference fringes, and Irepresents the minimum amount of light of the interference fringes, when the measurement device measures an optical performance of the projection optical system.