The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 26, 2008
Filed:
May. 10, 2006
Chii Guang Lee, Fremont, CA (US);
Shaoher X. Pan, San Jose, CA (US);
Hung Kwei HU, Saratoga, CA (US);
Chii Guang Lee, Fremont, CA (US);
Shaoher X. Pan, San Jose, CA (US);
Hung Kwei Hu, Saratoga, CA (US);
Spatial Photonics, Inc., Sunnyvale, CA (US);
Abstract
A method for fabricating a micro structure includes depositing a first layer of a first material over a substrate; patterning a first hard mask over the first layer; depositing a second layer of a second material over the first layer and the first hard mask; patterning a second hard mask over the second layer; and selectively removing the first material and the second material not covered by any of the first mask and the second mask to produce over the substrate the micro structure having a first structure portion having a first height and a second structure portion having a second height.