The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 26, 2008

Filed:

Jun. 14, 2002
Applicants:

Hisayasu Kaneshiro, Uji, JP;

Yasushi Nishikawa, Otsu, JP;

Kiyokazu Akahori, Otsu, JP;

Inventors:

Hisayasu Kaneshiro, Uji, JP;

Yasushi Nishikawa, Otsu, JP;

Kiyokazu Akahori, Otsu, JP;

Assignee:

Kaneka Corporation, Osaka, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29C 35/02 (2006.01); B28B 5/00 (2006.01); C07C 37/20 (2006.01);
U.S. Cl.
CPC ...
Abstract

A polyamide acid solution and/or gel film is subjected to at least any one of the following processes: addition of a semiconducting inorganic filler, addition of a conductivity imparting agent, and formation of a conductive film. Thereafter, the polyamide acid contained in the polyamide acid solution or gel film is imidized. Thus, the obtained semiconducting polyimide film has surface and volume resistances satisfactorily controllable and less dependent on voltage, excellent mechanical properties, and a high elongation rate.


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Kaneshiro, Hisayasu. (2008). Semiconductive polymide film and process for production thereof (U.S. Patent No. 7416695). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7416695

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