The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 19, 2008

Filed:

May. 05, 2006
Applicants:

Ke-xun Sun, Stanford, CA (US);

Graham S. Allen, Menlo Park, CA (US);

Robert L. Byer, Stanford, CA (US);

Inventors:

Ke-Xun Sun, Stanford, CA (US);

Graham S. Allen, Menlo Park, CA (US);

Robert L. Byer, Stanford, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 11/02 (2006.01); G01B 9/02 (2006.01); G01D 5/36 (2006.01);
U.S. Cl.
CPC ...
Abstract

Measurement of a distance change between a reference surface and a target is provided. A substrate has a first surface facing the target and including a grating. The grating and target combine to form an optical interferometer responsive to changes in distance between the grating and the target. A second surface of the substrate coincides with the reference surface and faces away from the target. Thickness information pertaining to the substrate is combined with results from the optical interferometer to provide a measurement of distance change between reference surface and target. The substrate is preferably a rigid material having picometer level dimensional stability.


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