The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 19, 2008
Filed:
Oct. 04, 2006
Applicants:
Young-dae Kim, Seoul, KR;
Dae-young Kim, Asan-si, KR;
Inventors:
Young-dae Kim, Seoul, KR;
Dae-young Kim, Asan-si, KR;
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 23/544 (2006.01);
U.S. Cl.
CPC ...
Abstract
A wafer structure with mirror shot is provided. A wafer structure according to the present invention comprises a first mirror shot area to which a mirror shot is applied, wherein the position of a first die is searched for based on the first mirror shot area. The wafer structure further comprises a second mirror shot area to which the mirror shot is applied. The second mirror shot area is located diagonally with respect to the first mirror shot area.