The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 19, 2008
Filed:
Dec. 20, 2006
Applicants:
Shinji Kishimura, Hyogo, JP;
Masayuki Endo, Osaka, JP;
Masaru Sasago, Osaka, JP;
Mitsuru Ueda, Tokyo, JP;
Hirokazu Imori, Aichi, JP;
Toshiaki Fukuhara, Kanagawa, JP;
Inventors:
Shinji Kishimura, Hyogo, JP;
Masayuki Endo, Osaka, JP;
Masaru Sasago, Osaka, JP;
Mitsuru Ueda, Tokyo, JP;
Hirokazu Imori, Aichi, JP;
Toshiaki Fukuhara, Kanagawa, JP;
Assignee:
Matsushita Electric Industrial Co., Ltd., Osaka, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01);
U.S. Cl.
CPC ...
Abstract
A base polymer of a resist material includes a unit represented by a general formula of the following Chemical Formula 3:
Kishimura, Shinji. (2008). Sulfonamide compound, polymer compound, resist material and pattern formation method (U.S. Patent No. 7413843). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7413843
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile