The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 19, 2008
Filed:
Dec. 21, 2004
Boris Kobrin, Walnut Creek, CA (US);
Romuald Nowak, Cupertino, CA (US);
Richard C. Yi, Santa Cruz, CA (US);
Jeffrey D. Chinn, Foster City, CA (US);
Boris Kobrin, Walnut Creek, CA (US);
Romuald Nowak, Cupertino, CA (US);
Richard C. Yi, Santa Cruz, CA (US);
Jeffrey D. Chinn, Foster City, CA (US);
Applied Microstructures, Inc., San Jose, CA (US);
Abstract
A vapor phase deposition method and apparatus for the application of thin layers and coatings on substrates. The method and apparatus are useful in the fabrication of electronic devices, micro-electromechanical systems (MEMS), Bio-MEMS devices, micro and nano imprinting lithography, and microfluidic devices. The apparatus used to carry out the method provides for the addition of a precise amount of each of the reactants to be consumed in a single reaction step of the coating formation process. The apparatus provides for precise addition of quantities of different combinations of reactants during a single step or when there are a number of different individual steps in the coating formation process. The precise addition of each of the reactants in vapor form is metered into a predetermined set volume at a specified temperature to a specified pressure, to provide a highly accurate amount of reactant.