The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 19, 2008
Filed:
Oct. 30, 2002
Tadashi Sano, Chiyoda, JP;
Ryo Miyake, Tsukuba, JP;
Akira Koide, Azuma, JP;
Norihide Saho, Tsuchiura, JP;
Akiomi Kono, Tomobe, JP;
Takeshi Harada, Abiko, JP;
Tadashi Sano, Chiyoda, JP;
Ryo Miyake, Tsukuba, JP;
Akira Koide, Azuma, JP;
Norihide Saho, Tsuchiura, JP;
Akiomi Kono, Tomobe, JP;
Takeshi Harada, Abiko, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
A reaction apparatus comprises a first supply flow channel having a fine flow channel cross sectional area for a liquid pressurized by a pressurizing device, a gas supply flow channel having a fine flow channel cross sectional area for supplying a gas, a two-phase flow channel having a fine flow channel cross sectional area in communication with a joined portion for the first supply flow channel and the second supply flow channel for flowing a gas/liquid two-phase fluid, a gas bubble reaction flow channel in communication with the exit of the gas/liquid two-phase channel and having a flow channel cross sectional area larger than that of the gas/liquid two-phase flow channel, and a liquid discharge flow channel for discharging the liquid in the gas bubble reaction flow channel. Therefore, in the reaction apparatus, a stable mixing ratio of a gas to a liquid can be obtained and the mixing speed of the gas to the liquid is increased.